Please use this identifier to cite or link to this item: https://idr.l3.nitk.ac.in/jspui/handle/123456789/16711
Full metadata record
DC FieldValueLanguage
dc.contributor.authorPoddar M.K.
dc.contributor.authorJalalzai P.
dc.contributor.authorSahir S.
dc.contributor.authorYerriboina N.P.
dc.contributor.authorKim T.-G.
dc.contributor.authorPark J.-G.
dc.date.accessioned2021-05-05T10:31:23Z-
dc.date.available2021-05-05T10:31:23Z-
dc.date.issued2021
dc.identifier.citationApplied Surface Science Vol. 537 , , p. -en_US
dc.identifier.urihttps://doi.org/10.1016/j.apsusc.2020.147862
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/16711-
dc.description.abstractEffects of single and mixed oxidants of Fe(NO3)3 and H2O2 containing acidic silica slurries were studied to investigate the mechanism of tungsten (W) chemical mechanical planarization (CMP). The W polishing rate obtained from the CMP test depicted high W polishing rate in the presence of mixed oxidants of Fe(NO3)3 and H2O2 as compared to a single oxidant of either H2O2 or Fe(NO3)3. The formation of a passive layer of tungsten oxide (WO3) and W dissolution could be the reason for these results as confirmed by XPS. Further investigation revealed that the generation of much stronger oxidants of hydroxyl radicals ([rad]OH) was solely responsible for WO3 layer formation. Quantitative evaluation of [rad]OH generation was estimated using a UV–visible spectrophotometer and confirmed that in-situ generation of hydroxyl radicals ([rad]OH) could be a main driving force for the high W polishing rate by converting a hard W film into a soft passive film of WO3. WO3 film formation was further confirmed using potentiodynamic polarization studies, which showed a smaller value of corrosion current density (Icorr) in mixed oxidants of Fe(NO3)3 and H2O2 as compared to the large values of Icorr observed for H2O2 alone. This study revealed that a single oxidizer of either Fe(NO3)3 or H2O2 was not capable of achieving a high W removal rate. Rather, only mixed oxidants of Fe(NO3)3 and H2O2 could cause a high W polishing rate due to excessive in-situ generation of [rad]OH radicals during the W CMP process. © 2020en_US
dc.titleTungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizersen_US
dc.typeArticleen_US
Appears in Collections:1. Journal Articles

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.