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DC Field | Value | Language |
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dc.contributor.author | Sibin, K.P. | |
dc.contributor.author | Srinivas, G. | |
dc.contributor.author | Shashikala, H.D. | |
dc.contributor.author | Dey, A. | |
dc.contributor.author | Sridhara, N. | |
dc.contributor.author | Sharma, A.K. | |
dc.contributor.author | Barshilia, H.C. | |
dc.date.accessioned | 2020-03-30T10:22:29Z | - |
dc.date.available | 2020-03-30T10:22:29Z | - |
dc.date.issued | 2018 | |
dc.identifier.citation | Materials Today: Proceedings, 2018, Vol.5, 4, pp.10787-10791 | en_US |
dc.identifier.uri | http://idr.nitk.ac.in/jspui/handle/123456789/8633 | - |
dc.description.abstract | Transparent and conducting thin films on flexible substrates have enormous applications in the areas of space, solar, displays, etc. We hereby report the sputter deposition of transparent and conducting ITO/Ag/ITO (IAI) thin films on commercially available flexible Kapton� substrate at a lower substrate temperature. IAI multilayer has been deposited by magnetron sputtering system using an alloy In:Sn (90% :10%) and Ag targets at room temperature without breaking the vacuum. The optimized IAI coating shows high transmittance (?81.3 % at ?= 650 nm) along with very low resistance (8.36 ?/). Optical haze value of IAI on Kapton was measured and found to be <7%. The figure of merit of IAI coating on Kapton� has been calculated using the Haacke's formula ? = r10/Rs. At ?= 650 nm ? = 15 � 10 ? was observed. Our findings give worthful insight into the sputter deposition of transparent conducting IAI coating on flexible Kapton� substrate for flexible electronics applications. � 2017 Elsevier Ltd. All rights reserved. | en_US |
dc.title | Optical and electrical studies of sputter-deposited transparent and conducting ITO/Ag/ITO multilayer on Kapton� substrate for transparent flexible electronic applications | en_US |
dc.type | Book chapter | en_US |
Appears in Collections: | 2. Conference Papers |
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