Please use this identifier to cite or link to this item: https://idr.l3.nitk.ac.in/jspui/handle/123456789/8633
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dc.contributor.authorSibin, K.P.
dc.contributor.authorSrinivas, G.
dc.contributor.authorShashikala, H.D.
dc.contributor.authorDey, A.
dc.contributor.authorSridhara, N.
dc.contributor.authorSharma, A.K.
dc.contributor.authorBarshilia, H.C.
dc.date.accessioned2020-03-30T10:22:29Z-
dc.date.available2020-03-30T10:22:29Z-
dc.date.issued2018
dc.identifier.citationMaterials Today: Proceedings, 2018, Vol.5, 4, pp.10787-10791en_US
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/8633-
dc.description.abstractTransparent and conducting thin films on flexible substrates have enormous applications in the areas of space, solar, displays, etc. We hereby report the sputter deposition of transparent and conducting ITO/Ag/ITO (IAI) thin films on commercially available flexible Kapton� substrate at a lower substrate temperature. IAI multilayer has been deposited by magnetron sputtering system using an alloy In:Sn (90% :10%) and Ag targets at room temperature without breaking the vacuum. The optimized IAI coating shows high transmittance (?81.3 % at ?= 650 nm) along with very low resistance (8.36 ?/). Optical haze value of IAI on Kapton was measured and found to be <7%. The figure of merit of IAI coating on Kapton� has been calculated using the Haacke's formula ? = r10/Rs. At ?= 650 nm ? = 15 � 10 ? was observed. Our findings give worthful insight into the sputter deposition of transparent conducting IAI coating on flexible Kapton� substrate for flexible electronics applications. � 2017 Elsevier Ltd. All rights reserved.en_US
dc.titleOptical and electrical studies of sputter-deposited transparent and conducting ITO/Ag/ITO multilayer on Kapton� substrate for transparent flexible electronic applicationsen_US
dc.typeBook chapteren_US
Appears in Collections:2. Conference Papers

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